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ISO 23170:2022

Surface chemical analysis - Depth profiling - Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
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ISO 23170:2022

Surface chemical analysis - Depth profiling - Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

SDO ISO: International Organization for Standardization
Document Number ISO 23170
Publication Date Not Available
Language en - English
Page Count
Revision Level
Supercedes
Committee ISO/TC 201/SC 4
Publish Date Document Id Type View
Not Available ISO 23170:2022 Revision