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ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
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ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

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This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

SDO ISO: International Organization for Standardization
Document Number ISO 21859
Publication Date Not Available
Language en - English
Page Count
Revision Level
Supercedes
Committee ISO/TC 206
Publish Date Document Id Type View
Not Available ISO 21859:2019 Revision