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ISO 16531:2020

Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
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ISO 16531:2020

Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

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This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1 mm in diameter. The methods do not include depth resolution optimization.

SDO ISO: International Organization for Standardization
Document Number ISO 16531
Publication Date Not Available
Language en - English
Page Count
Revision Level
Supercedes
Committee ISO/TC 201/SC 4
Publish Date Document Id Type View
Not Available ISO 16531:2020 Revision