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ISO 13424:2013

Surface chemical analysis - X-ray photoelectron spectroscopy - Reporting of results of thin-film analysis
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ISO 13424:2013

Surface chemical analysis - X-ray photoelectron spectroscopy - Reporting of results of thin-film analysis

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ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.

SDO ISO: International Organization for Standardization
Document Number ISO 13424
Publication Date Not Available
Language en - English
Page Count
Revision Level
Supercedes
Committee ISO/TC 201/SC 7
Publish Date Document Id Type View
Not Available ISO 13424:2013 Revision